Method and system for design of a reticle to be manufactured using variable shaped beam lithography
US8828628B2 · kind B2 · utility
19Cited by
43References
21Claims
0Family size
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Key dates
| Filing date | Aug 19, 2013 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | Aug 19, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24479
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for optical proximity correction (OPC) is disclosed, in which a set of VSB shots is determined, where the set of shots can approximately form a target reticle pattern that is an OPC-compensated version of an input pattern. The set of shots is simulated to create a simulated reticle pattern. A substrate image is calculated, based on using the simulated reticle pattern in an optical lithographic process to form the substrate image. A system for OPC is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.