Unit magnification large-format catadioptric lens for microlithography
US8830590B2 · kind B2 · utility
1Cited by
17References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 20, 2013 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | May 28, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A unit magnification Wynn-Dyson lens for microlithography has an image field sized to accommodate between four and six die of dimensions 26 mm×36 mm. The lens has a positive lens group that consists of either three or four refractive lens elements, with one of the lens elements being most mirror-wise and having a prism-wise concave aspheric surface. Protective windows respectively reside between object and image planes and the corresponding prism faces. The lens is corrected for at least the i-line LED wavelength spectrum or similar LED-generated wavelengths.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.