Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device
US8832607B2 · kind B2 · utility
1Cited by
1References
15Claims
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Key dates
| Filing date | Aug 30, 2012 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | Aug 30, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.