Yosuke Okamoto
20Patents
3h-index
29Co-inventors
59Inventor score
Filing activity: Mar 29, 2005 → Dec 10, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7953263B2 | X-ray CT apparatus and image processing apparatus | Physics | 18 | Active |
| US8320658B2 | Unevenness inspection method, method for manufacturing display panel, and unevenness inspection apparatus | Physics | 5 | Active |
| US7538448B2 | Power supply circuit structure comprising a current sensor, and method of assembling the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US9244365B2 | Method for measuring pattern misalignment | Physics | 3 | Active |
| US8914766B2 | Dose-data generating apparatus | Electricity | 3 | Active |
| US7609803B2 | Method for estimating scattered ray intensity in X-ray CT and X-ray CT apparatus | Human Necessities | 3 | Active |
| US7457741B2 | Device for transmitting speech information | Physics | 2 | Active |
| US8790851B2 | Mask and method for fabricating semiconductor device | Physics | 2 | Active |
| US8859167B2 | Pattern forming method, positional deviation measuring method and photomask | Physics | 1 | Active |
| US8976356B2 | Measurement mark, method for measurement, and measurement apparatus | Physics | 1 | Active |
| US9952505B2 | Imprint device and pattern forming method | Physics | 1 | Active |
| US8832607B2 | Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device | Physics | 1 | Active |
| US9784573B2 | Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor device | Electricity | 1 | Active |
| US9941177B2 | Pattern accuracy detecting apparatus and processing system | Physics | 0 | Active |
| US12243237B2 | Pattern-edge detection method, pattern-edge detection apparatus, and storage medium storing program for causing a computer to perform pattern-edge detection | Physics | 0 | Active |
| US9146458B2 | EUV mask | Physics | 0 | Active |
| US10599056B1 | Position measuring method, position measuring apparatus, and semiconductor device manufacturing method | Electricity | 0 | Active |
| US8504951B2 | Dose-data generating apparatus, dose-data generating method, and manufacturing method of semiconductor device | Electricity | 0 | Active |
| US8953163B2 | Exposure apparatus, exposure method, and method of manufacturing semiconductor device | Physics | 0 | Active |
| US8778570B2 | Photomask and method for manufacturing the same | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.