Patent · US Active

System and a method for generating periodic and/or quasi-periodic pattern on a sample

US8841046B2 · kind B2 · utility

3Cited by
16References
15Claims
0Family size

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Inventor

Key dates

Filing dateOct 13, 2005
Grant dateSep 23, 2014
Priority date—
Expiry dateOct 28, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/7035
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.