Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
US8841060B2 · kind B2 · utility
8Cited by
17References
20Claims
0Family size
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Key dates
| Filing date | Jun 29, 2012 |
| Grant date | Sep 23, 2014 |
| Priority date | — |
| Expiry date | Nov 6, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided.The actinic-ray-sensitive or radiation-sensitive resin composition contains:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.