Patent · US Active

Method for nanolithography

US8841637B2 · kind B2 · utility

0Cited by

1References

18Claims

0Family size

Inventors

Franklin Mark Schellenberg · Palo Alto, US
Keith Edward Bennett · Palo Alto, US

Key dates

Filing date	Aug 12, 2013
Grant date	Sep 23, 2014
Priority date	—
Expiry date	Aug 12, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG11B7/00
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light transmitted through specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the object to be exposed. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the multiple individual channels and the multiple exposures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.