System and method for generating extreme ultraviolet light
US8847181B2 · kind B2 · utility
5Cited by
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11Claims
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Key dates
| Filing date | Feb 22, 2012 |
| Grant date | Sep 30, 2014 |
| Priority date | — |
| Expiry date | Feb 22, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0086
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.