Lithographic apparatus, composite material and manufacturing method
US8848169B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2009 |
| Grant date | Sep 30, 2014 |
| Priority date | — |
| Expiry date | Feb 17, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device may be capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus may be provided with a composite material wherein a layer of carbon fiber and a layer of titanium is provided within the composite.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.