Composition for coating over a photoresist pattern
US8852848B2 · kind B2 · utility
3Cited by
16References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2010 |
| Grant date | Oct 7, 2014 |
| Priority date | — |
| Expiry date | Jul 5, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/544
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.