Jian Yin
18Patents
7h-index
33Co-inventors
62Inventor score
Filing activity: Oct 31, 2005 → Mar 18, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8329387B2 | Antireflective coating compositions | Chemistry; Metallurgy | 37 | Active |
| US8691925B2 | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | Physics | 21 | Active |
| US7638262B2 | Antireflective composition for photoresists | Emerging Cross-Sectional Technologies | 11 | Active |
| US8835581B2 | Neutral layer polymer composition for directed self assembly and processes thereof | Chemistry; Metallurgy | 11 | Active |
| US9574104B1 | Compositions and processes for self-assembly of block copolymers | Performing Operations; Transporting | 9 | Active |
| US8039201B2 | Antireflective coating composition and process thereof | Physics | 9 | Active |
| US8686109B2 | Methods and materials for removing metals in block copolymers | Chemistry; Metallurgy | 8 | Active |
| US7553905B2 | Anti-reflective coatings | Emerging Cross-Sectional Technologies | 7 | Active |
| US9040659B2 | Methods and materials for removing metals in block copolymers | Chemistry; Metallurgy | 4 | Active |
| US9181449B2 | Underlayer composition for promoting self assembly and method of making and using | Physics | 4 | Active |
| US9052598B2 | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | Physics | 4 | Active |
| US9093263B2 | Underlayer composition for promoting self assembly and method of making and using | Electricity | 4 | Active |
| US8852848B2 | Composition for coating over a photoresist pattern | Chemistry; Metallurgy | 3 | Active |
| US9291909B2 | Composition comprising a polymeric thermal acid generator and processes thereof | Physics | 2 | Active |
| US9505945B2 | Silicon containing block copolymers for direct self-assembly application | Performing Operations; Transporting | 1 | Active |
| US10155879B2 | Compositions and use thereof for modification of substrate surfaces | Electricity | 0 | Active |
| US11518730B2 | Polymer compositions for self-assembly applications | Chemistry; Metallurgy | 0 | Active |
| US11919948B2 | Isoform-selective anti-TGFβ antibodies and methods of use | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.