Patent · US Active

Method for laser machining a sample having a crystalline structure

US8853592B2 · kind B2 · utility

2Cited by
41References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 9, 2009
Grant dateOct 7, 2014
Priority date
Expiry dateSep 4, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/2813
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A charged particle beam and a laser beam are used together to micromachine a substrate. A first beam alters the state of a region of the work piece, and the second beam removes material whose state was altered. In one embodiment, an ion beam can create photon absorbing defects to lower the local ablation threshold, allowing the laser beam to remove material in a region defined by the ion beam. The combination of laser beam and charged particle beam allows the creation of features similar in size to the charged particle beam spot size, at milling rates greater than charged particle processing because of the increased energy provided by the laser beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.