Method to create gradient index in a polymer
US8859190B1 · kind B1 · utility
9Cited by
4References
17Claims
0Family size
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Key dates
| Filing date | Sep 4, 2013 |
| Grant date | Oct 14, 2014 |
| Priority date | — |
| Expiry date | Sep 4, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70375
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of Δn≧1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.