William C. Sweatt
49Patents
20h-index
55Co-inventors
88Inventor score
Filing activity: Nov 21, 1985 → Sep 25, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6504943B1 | Information-efficient spectral imaging sensor | Physics | 153 | Expired |
| US5870176A | Maskless lithography | Emerging Cross-Sectional Technologies | 137 | Expired |
| US8736108B1 | Photovoltaic system | Electricity | 72 | Active |
| US9029681B1 | Microsystem enabled photovoltaic modules and systems | Emerging Cross-Sectional Technologies | 68 | Active |
| US5512759A | Condenser for illuminating a ringfield camera with synchrotron emission light | Physics | 64 | Expired |
| US5361292A | Condenser for illuminating a ring field | Physics | 63 | Expired |
| US6060224A | Method for maskless lithography | Emerging Cross-Sectional Technologies | 61 | Expired |
| US5805365A | Ringfield lithographic camera | Physics | 60 | Expired |
| US6285737A | Condenser for extreme-UV lithography with discharge source | Physics | 57 | Expired |
| US6262845A | Apparatus and method for generating partially coherent illumination for photolithography | Physics | 50 | Expired |
| US6678048B1 | Information-efficient spectral imaging sensor with TDI | Electricity | 49 | Expired |
| US7286295B1 | Microoptical compound lens | Physics | 46 | Active |
| US5729365A | Computer generated holographic microtags | Physics | 46 | Expired |
| US6118577A | Diffractive element in extreme-UV lithography condenser | Emerging Cross-Sectional Technologies | 40 | Expired |
| US6875544B1 | Method for the fabrication of three-dimensional microstructures by deep X-ray lithography | Physics | 36 | Expired |
| US6469827B1 | Diffraction spectral filter for use in extreme-UV lithography condenser | Physics | 35 | Expired |
| US5148442A | Dye lasing arrangement including an optical assembly for altering the cross-section of its pumping beam and method | Electricity | 23 | Expired |
| US7683310B1 | Laser warning receiver to identify the wavelength and angle of arrival of incident laser light | Physics | 22 | Active |
| US6396068B1 | Illumination system having a plurality of movable sources | Physics | 21 | Expired |
| US4664488A | Light reflecting apparatus including a multi-aberration light reflecting surface | Physics | 20 | Expired |
| US6225027A | Extreme-UV lithography system | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6549700B1 | Optical switch using Risley prisms | Physics | 17 | Expired |
| US5920380A | Apparatus and method for generating partially coherent illumination for photolithography | Physics | 15 | Expired |
| US7449699B1 | Method and apparatus for creating a topography at a surface | Electricity | 14 | Active |
| US6210865A | Extreme-UV lithography condenser | Emerging Cross-Sectional Technologies | 14 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.