Cleaning methods for improved photovoltaic module efficiency
US8864915B2 · kind B2 · utility
1Cited by
1References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 3, 2011 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Apr 5, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of processing a substrate having a transparent conductive oxide disposed thereon, including: exposing the substrate to a first cleaning solution comprising hydrogen peroxide and ammonium citrate; exposing the substrate to a second cleaning solution having a pH within a range from about 6 to about 7, the second cleaning solution different than the first cleaning solution; agitating the second cleaning solution; and depositing a silicon-containing film on the transparent conductive oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.