Patent · US Active

Plasma supply device

US8866400B2 · kind B2 · utility

0Cited by

63References

20Claims

0Family size

Assignee

TRUMPF HUETTINGER GMBH + CO. KG · DE

Inventors

Thomas Kirchmeier · Teningen, DE
Michael Glueck · Schreiber, CA

Key dates

Filing date	Mar 21, 2013
Grant date	Oct 21, 2014
Priority date	—
Expiry date	Mar 21, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02B20/00
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.