High frequency deflection measurement of IR absorption
US8869602B2 · kind B2 · utility
17Cited by
2References
30Claims
0Family size
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Key dates
| Filing date | Nov 30, 2011 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | Jan 14, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/1721
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An AFM based technique has been demonstrated for performing highly localized IR spectroscopy on a sample surface by using the AFM probe to detect wavelength dependent IR radiation interaction, typically absorption with the sample in the region of the tip. The tip may be configured to produce electric field enhancement when illuminated by a radiation source. This enhancement allows for significantly reduced illumination power levels resulting in improved spatial resolution by confining the sample-radiation interaction to the region of field enhancement which is highly localized to the tip.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.