Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same
US8871423B2 · kind B2 · utility
4Cited by
10References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2011 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | Mar 4, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.