Jin-A Ryu
7Patents
2h-index
25Co-inventors
47Inventor score
Filing activity: Feb 12, 2003 → Jan 13, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6838223B2 | Compositions for anti-reflective light absorbing layer and method for forming patterns in semiconductor device using the same | Physics | 9 | Expired |
| US8871423B2 | Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same | Emerging Cross-Sectional Technologies | 4 | Active |
| US9528949B2 | Methods of detecting inhomogeneity of a layer and apparatus for performing the same | Physics | 1 | Active |
| US7964332B2 | Methods of forming a pattern of a semiconductor device | Emerging Cross-Sectional Technologies | 1 | Active |
| US7026497B2 | Adhesive compound and method for forming photoresist pattern using the same | Physics | 1 | Expired |
| US7442489B2 | Photoresist composition and method of forming a photoresist pattern using the same | Emerging Cross-Sectional Technologies | 0 | Active |
| US10712662B2 | Methods of forming patterns using compositions for an underlayer of photoresist | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.