Methods and devices for forming nanostructure monolayers and devices including such monolayers
US8871623B2 · kind B2 · utility
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Key dates
| Filing date | Apr 11, 2014 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | Apr 11, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/891
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods are provided for forming a nanostructure array. An example method includes providing a first layer, providing nanostructures dispersed in a solution comprising a liquid form of a spin-on-dielectric, wherein the nanostructures comprise a silsesquioxane ligand coating, disposing the solution on the first layer, whereby the nanostructures form a monolayer array on the first layer, and curing the liquid form of the spin-on-dielectric to provide a solid form of the spin-on-dielectric. Numerous other aspects are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.