Charged particle beam writing apparatus and charged particle beam writing method
US8878149B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 3, 2011 |
| Grant date | Nov 4, 2014 |
| Priority date | — |
| Expiry date | Aug 1, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31762
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A charged particle beam writing apparatus includes a storage unit configured to store writing data in which there are defined a plurality of figures and resizing information indicating, with respect to each of the plurality of figures, a resizing status whether or not to perform resizing and a resizing direction used when performing resizing, a judgment determination unit configured to input the writing data and judge, with respect to each of the plurality of figures, the resizing status whether or not to perform resizing and the resizing direction used when performing resizing, a resize processing unit configured to resize, with respect to each of the plurality of figures, a dimension of a figure concerned in a judged resizing direction when it is judged to perform resizing, and a writing unit configured to write a pattern onto a target workpiece with using a resized figure and a charged particle beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.