Method for using a purge ring with split baffles in photonic thermal processing systems
US8883406B2 · kind B2 · utility
5Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2013 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Nov 5, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0318
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for supplying a first gas and a second gas using a purge ring in a photonic processing system includes arranging a first layer and a second layer to define a first plenum and a first baffle, arranging the second layer and a third layer to define a second plenum and a second baffle, receiving a first gas at the first plenum that flows through the first plenum and the first baffle to an inner region, and receiving a second gas at the second plenum that flows through the second plenum and the second baffle to the inner region. The second baffle is one of less restrictive and more restrictive than the first baffle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.