Method of treating an oxidized layer of metal nitride
US8883654B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Feb 29, 2012 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Jul 16, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S257/915
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present arrangement provides a method of treating an oxidized layer of metal nitride, including oxidizing a layer (2) of metal oxide at the surface of a first layer (1) of nitride of said metal using a plasma of an oxidizing species with an oxidation number that is greater than that of oxygen in order to form a metallic layer (3) of a compound based on said metal; and reducing the metallic layer (3) formed in step i) using a plasma of hydrogen and nitrogen to form a second layer (4) of nitride of said metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.