Over-voltage protection during arc recovery for plasma-chamber power supplies
US8884180B2 · kind B2 · utility
72Cited by
126References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 5, 2013 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Mar 5, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.