Methods and systems for in-situ pyrometer calibration
US8888360B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2011 |
| Grant date | Nov 18, 2014 |
| Priority date | — |
| Expiry date | Jun 10, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J5/80
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of in-situ pyrometer calibration for a wafer treatment reactor such as a chemical vapor deposition reactor desirably includes the steps of positioning a calibrating pyrometer at a first calibrating position and heating the reactor until the reactor reaches a pyrometer calibration temperature. The method desirably further includes rotating the support element about the rotational axis, and while the support element is rotating about the rotational axis, obtaining first operating temperature measurements from a first operating pyrometer installed at a first operating position, and obtaining first calibrating temperature measurements from the calibration pyrometer. Both the calibrating pyrometer and the first operating pyrometer desirably are adapted to receive radiation from a first portion of a wafer support element at a first radial distance from a rotational axis of the wafer support element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.