Pattern data system for high-performance maskless electron beam lithography
US8893059B2 · kind B2 · utility
10Cited by
1References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 30, 2013 |
| Grant date | Nov 18, 2014 |
| Priority date | — |
| Expiry date | Jan 30, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31762
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One embodiment relates to a pattern data system for maskless electron beam lithography. The system includes a renderer that receives pre-exposure die image data, performs rendering of the pre-exposure die image data to generate raster data. The system further includes a plurality of data distributors communicatively coupled to the renderer. Each data distributor adapts the raster data to characteristics of an associated pattern writer. Other embodiments, aspects and feature are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.