Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method
US8895226B2 · kind B2 · utility
4Cited by
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17Claims
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Key dates
| Filing date | Mar 24, 2014 |
| Grant date | Nov 25, 2014 |
| Priority date | — |
| Expiry date | Mar 24, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.