Gradient-based pattern and evaluation point selection
US8898599B2 · kind B2 · utility
13Cited by
15References
20Claims
0Family size
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Key dates
| Filing date | May 29, 2013 |
| Grant date | Nov 25, 2014 |
| Priority date | — |
| Expiry date | May 29, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Described herein is a method for a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic imaging apparatus, the lithographic process having a plurality of design variables, the method comprising: calculating a gradient of each of a plurality of evaluation points or patterns of the lithographic process, with respect to at least one of the design variables; and selecting a subset of evaluation points from the plurality of evaluation points or patterns based on the gradient.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.