Patent · US Active

Layout optimization for integrated design

US8898600B2 · kind B2 · utility

3Cited by
5References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 15, 2013
Grant dateNov 25, 2014
Priority date
Expiry dateJul 15, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2119/18
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method for laying out a target pattern includes assigning a keep-out zone to an end of a first feature within a target pattern, and positioning other features such that ends of the other features of the target pattern do not have an end within the keep-out zone. The target pattern is to be formed with a corresponding main feature and cut pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.