System for placing dummy tiles in metal layers of integrated circuit design
US8898612B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2013 |
| Grant date | Nov 25, 2014 |
| Priority date | — |
| Expiry date | Oct 30, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An electronic design automation (EDA) tool for inserting dummy tiles between interconnect lines of an integrated circuit design includes a memory for storing the integrated circuit design and a processor in communication with the memory. The processor identifies those interconnect lines that are at different voltage levels, have a length greater than a predefined threshold length and a spacing less than a predefined threshold spacing, and inserts blockage areas between such interconnect lines. The processor skips the blockage areas and adds dummy tiles only between those interconnect lines that do not meet predetermined criteria.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.