Patent · US Active

Sputtering apparatus

US8900428B2 · kind B2 · utility

2Cited by
6References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 6, 2012
Grant dateDec 2, 2014
Priority date
Expiry dateApr 30, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/3482
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

In one embodiment, a magnetron assembly comprises a plurality of magnets and a yoke configured to hold the plurality of magnets in at least four independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion. The outer portion substantially surrounds the perimeter of the inner portion. The magnets used to form the outer portion have a first polarity and the magnets used to form the inner portion having a second polarity. The outer portion of the pattern comprises a pair of elongated sections that are substantially parallel to one another. The outer portion of the pattern comprises a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections and wherein each turnaround section comprises a plurality of magnets having the first polarity. Other embodiments are described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.