Photoresist composition
US8900790B2 · kind B2 · utility
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1References
5Claims
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Key dates
| Filing date | Sep 13, 2010 |
| Grant date | Dec 2, 2014 |
| Priority date | — |
| Expiry date | May 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I):wherein R1 represents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc., R2 and R3 each independently represent a hydrogen atom, etc., R4, R5 and R6 each independently represent a hydrogen atom, etc., A1 represents a single bond or a C1-C2 alkylene group in which one or more —CH2— can be replaced by —O—.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.