Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

US8900791B2 · kind B2 · utility

Assignee

• FUJIFILM Corporation · JP

Inventors

• Tomotaka Tsuchimura · Shizuoka, JP
• Koji Shirakawa · Shizuoka, JP
• Toru Tsuchihashi · Shizuoka, JP
• Hideaki Tsubaki · Shizuoka, JP

Key dates

• Filing date: Mar 24, 2011
• Grant date: Dec 2, 2014
• Expiry date: Jul 25, 2032

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/122
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below;