Method and apparatus for printing high-resolution two-dimensional periodic patterns
US8904316B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2011 |
| Grant date | Dec 2, 2014 |
| Priority date | — |
| Expiry date | Nov 16, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer. The method includes providing a mask bearing a pattern of at least two overlapping sub-patterns which have a second symmetry and a second period, the features of each sub-pattern being formed in a transmissive material, providing a substrate bearing the layer, arranging the mask with a separation from the substrate, providing light having a central wavelength for illuminating the mask to generate a light-field in which light of the central wavelength forms a range of intensity distributions between Talbot planes, illuminating said mask pattern with said light while maintaining the separation or changing it by a distance whereby the photosensitive layer is exposed to an average of the range of intensity distributions, wherein the light transmitted by each sub-pattern is shifted in phase relative to that transmitted by another sub-pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.