Microelectronic cleaning and arc remover compositions
US8906838B2 · kind B2 · utility
3Cited by
16References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 27, 2003 |
| Grant date | Dec 9, 2014 |
| Priority date | — |
| Expiry date | Jul 9, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/122
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k di-electrics and copper or aluminum metallizations contain a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols and a strong alkaline base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.