Methods of making molybdenum titanium sputtering plates and targets
US8911528B2 · kind B2 · utility
1Cited by
47References
2Claims
0Family size
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Key dates
| Filing date | Nov 2, 2010 |
| Grant date | Dec 16, 2014 |
| Priority date | — |
| Expiry date | Jul 20, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the β(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase β(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.