Patent · US Active

Photoresist overcoat compositions and methods of forming electronic devices

US8921031B2 · kind B2 · utility

7Cited by

8References

17Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Young Cheol Bae · Weston, US
Rosemary Bell · Wayland, US
Jong Keun Park · Hudson, US
Seung Hyun Lee · Seojong-myeon, KR

Key dates

Filing date	Sep 9, 2012
Grant date	Dec 30, 2014
Priority date	—
Expiry date	Oct 11, 2032

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/12
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.