Fluorinated silazane release agents in nanoimprint lithography

US8926888B2 · kind B2 · utility

Assignee

• The Board of Regents of the University of Texas System · US

Inventors

• Carlton G. Willson · Austin, US
• Tsuyoshi Ogawa · Yokohama, JP
• Michael W. Lin · Bellaire, US
• Daniel J. Hellebusch · Oakland, US
• B. Michael Jacobsson · Fort Worth, US
• William K. Bell · Austin, US

Key dates

• Filing date: Feb 24, 2012
• Grant date: Jan 6, 2015
• Expiry date: Nov 10, 2032

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B82Y40/00
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

An imprint lithography release agent having general formula (1):where R1 represents H or CH3, n is an integer from 1 to 5, and m is an integer from 1 to 40. Fluorinated silazanes of general formula (1) can be used to form a release layer on an imprint lithography template, added to an imprint lithography resist, or both.