Photoresist comprising nitrogen-containing compound
US8927190B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Jan 25, 2011 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Jun 13, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
New nitrogen-containing compounds are provided that comprise multiple hydroxyl moieties and photoresist compositions that comprise such nitrogen-containing compounds. Preferred nitrogen-containing compounds comprise 1) multiple hydroxyl substituents (i.e. 2 or more) and 2) one or more photoacid-labile groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.