Coating composition for use with an overcoated photoresist
US8927681B2 · kind B2 · utility
1Cited by
16References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2009 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Aug 31, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31786
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.