Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method
US8927906B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 2011 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Jun 30, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B3/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosed heating device is to perform a heating process on an exposed substrate formed with a resist film before a developing process, the device including a heating part to perform a heating process on the exposed substrate, the heating part including a plurality of two-dimensionally arranged heating elements; a seating part provided at an upper side of the heating part, on which the substrate is disposed; and a control part to correct a setting temperature of the heating part based on temperature correction values, and to control the heating part based on the corrected setting temperature, during the heating process on one substrate by the heating part, wherein the temperature correction values being previously obtained from measured critical dimensions of the resist pattern in another substrate formed with the resist pattern through the heating process by the heating part and then the developing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.