Patent · US Active

Micromechanical component and method for the manufacture of same

US8928099B2 · kind B2 · utility

0Cited by

4References

9Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Johannes Classen · Reutlingen, DE
Jochen Reinmuth · Reutlingen, DE
Andreas Scheurle · Leonberg, DE

Key dates

Filing date	Feb 1, 2013
Grant date	Jan 6, 2015
Priority date	—
Expiry date	Feb 1, 2033

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81B2201/025
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

A method for manufacturing a micromechanical component is described in which a trench etching process and a sacrificial layer etching process are carried out to form a mass situated movably on a substrate. The movable mass has electrically isolated and mechanically coupled subsections of a functional layer. A micromechanical component having a mass situated movably on a substrate is also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.