Alignment marks in substrate having through-substrate via (TSV)
US8928159B2 · kind B2 · utility
21Cited by
40References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 2, 2010 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Aug 4, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/14
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A device includes a substrate, and an alignment mark including a conductive through-substrate via (TSV) penetrating through the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.