Auto focus system for reticle inspection
US8928895B2 · kind B2 · utility
0Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2010 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Mar 6, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.