Resist composition, method of forming resist pattern, novel compound, and acid generator
US8932795B2 · kind B2 · utility
2Cited by
5References
6Claims
0Family size
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Key dates
| Filing date | May 12, 2011 |
| Grant date | Jan 13, 2015 |
| Priority date | — |
| Expiry date | Jun 12, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, RX represents a divalent aliphatic group of 3 to 20 carbon atoms; RY represents a monovalent aliphatic group of 3 to 20 carbon atoms having —C(═O)—O— or —S(═O)2—; each of R1 and R2 independently represents a divalent linking group; and Z+ represents a monovalent organic cation).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.