Photoacid generators

US8932797B2 · kind B2 · utility

Assignees

• DOW GLOBAL TECHNOLOGIES LLC · US
• Rohm and Haas Electronic Materials LLC · US

Inventors

• James W. Thackeray · Braintree, US
• Suzanne M. Coley · Mansfield, US
• James F. Cameron · Brookline, US
• Paul J. LaBeaume · Auburn, US
• Ahmad E. Madkour · Leverett, US
• Owendi Ongayi · Marlborough, US
• Vipul Jain · Irvine, US

Key dates

• Filing date: Nov 30, 2011
• Grant date: Jan 13, 2015
• Expiry date: Nov 30, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/123
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A photoacid generator compound has formula (I):G+Z−  (I)wherein G has formula (II):In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or monocyclic C3-30 cycloalkyl; polycyclic or monocyclic C6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R0 groups are further attached to an adjacent R0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.