Optical imaging with reduced immersion liquid evaporation effects
US8934079B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 31, 2011 |
| Grant date | Jan 13, 2015 |
| Priority date | — |
| Expiry date | Sep 27, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.