Stephan Six
10Patents
2h-index
30Co-inventors
50Inventor score
Filing activity: Oct 2, 2007 → Sep 23, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7738187B2 | Optical element, projection lens and associated projection exposure apparatus | Physics | 46 | Active |
| US8279402B2 | Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same | Physics | 5 | Active |
| US8934079B2 | Optical imaging with reduced immersion liquid evaporation effects | Physics | 2 | Active |
| US8564925B2 | Wafer chuck for EUV lithography | Physics | 1 | Active |
| US9645513B2 | Optical imaging with reduced immersion liquid evaporation effects | Physics | 1 | Active |
| US8007711B2 | Method for operating a converter | Chemistry; Metallurgy | 1 | Active |
| US11162778B2 | Method for determining material removal and device for the beam machining of a workpiece | Electricity | 0 | Active |
| US11328831B2 | Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus | Physics | 0 | Active |
| US9733395B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
| US10107943B2 | Optical imaging with reduced immersion liquid evaporation effects | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.