Gas analysis apparatus
US8934101B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2012 |
| Grant date | Jan 13, 2015 |
| Priority date | — |
| Expiry date | Aug 10, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8578
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas analysis apparatus includes: a first reflector that reflects measurement light from a light emitting unit disposed outside a gas flue wall and transmitted through a sample gas. A light receiving unit outside the gas flue wall receives measurement light reflected by the first reflector. A second reflector outside the gas flue wall reflects measurement light toward the light receiving unit. A computing unit analyzes sample gas by allowing the measurement light to be reflected by the first reflector and performs correction or calibration of the gas analysis apparatus using known substances within an associated containing unit along the light path between the light emitting unit and the second reflector by allowing measurement light to be reflected by the second reflector. A switching unit outside the gas flue wall selectively removes or inserts the second reflector from the light path during component concentration analysis and correction or calibration, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.