Patent · US Active

Techniques of optical proximity correction using GPU

US8938696B1 · kind B1 · utility

15Cited by

0References

7Claims

0Family size

Assignee

D2S, Inc. · US

Inventors

Ilhami H. Torunoglu · Monte Sereno, US
Ahmet Karakas · Palo Alto, US
Erich E. Elsen · Mountain View, US

Key dates

Filing date	Jul 15, 2013
Grant date	Jan 20, 2015
Priority date	—
Expiry date	Jul 15, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P90/02
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

Computationally intensive electronic design automation operations are accelerated with algorithms utilizing one or more graphics processing units. The optical proximity correction (OPC) process calculates, improves, and optimizes one or more features on an exposure mask (used in semiconductor or other processing) so that a resulting structure realized on an integrated circuit or chip meets desired design and performance requirements. When a chip has billions of transistors or more, each with many fine structures, the computational requirements for OPC can be very large. This processing can be accelerated using one or more graphics processing units.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.